| |
| * | 2009 | |
|---|---|---|
| 4 | EE | Aswin Sreedhar, Sandip Kundu: On linewidth-based yield analysis for nanometer lithography. DATE 2009: 381-386 |
| 2008 | ||
| 3 | EE | Aswin Sreedhar, Alodeep Sanyal, Sandip Kundu: On Modeling and Testing of Lithography Related Open Faults in Nano-CMOS Circuits. DATE 2008: 616-621 |
| 2 | EE | Aswin Sreedhar, Sandip Kundu: Modeling and analysis of non-rectangular transistors caused by lithographic distortions. ICCD 2008: 444-449 |
| 2007 | ||
| 1 | EE | Aswin Sreedhar, Sandip Kundu: On modeling impact of sub-wavelength lithography on transistors. ICCD 2007: 84-90 |
| 1 | Sandip Kundu | [1] [2] [3] [4] |
| 2 | Alodeep Sanyal | [3] |