| 2007 |
|---|
| 6 | EE | Louis Scheffer,
Lars Liebmann,
Riko Rakojcic,
David White:
Rules vs tools: what's the right way to address IC manufacturing complexity?
ISPD 2007: 75-76 |
| 2003 |
|---|
| 5 | EE | Lars Liebmann:
Layout impact of resolution enhancement techniques: impediment or opportunity?
ISPD 2003: 110-117 |
| 2002 |
|---|
| 4 | EE | Mark A. Lavin,
Lars Liebmann:
CAD computation for manufacturability: can we save VLSI technology from itself?
ICCAD 2002: 424-431 |
| 2001 |
|---|
| 3 | EE | Lars Liebmann,
Jennifer Lund,
Fook-Luen Heng,
Ioana Graur:
Enabling Alternating Phase Shifted Mask Designs for a Full Logic Gate Level: Design Rules and Design Rule Checking.
DAC 2001: 79-84 |
| 2 | EE | Fook-Luen Heng,
Lars Liebmann,
Jennifer Lund:
Application of automated design migration to alternating phase shift mask design.
ISPD 2001: 38-43 |
| 1 | EE | Lars Liebmann,
Scott M. Mansfield,
Alfred K. Wong,
Mark A. Lavin,
William C. Leipold,
Timothy G. Dunham:
TCAD development for lithography resolution enhancement.
IBM Journal of Research and Development 45(5): 651-666 (2001) |
