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Yoshihiko Hirai Vis

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*1991
2EEYoshihiko Hirai, Sadafumi Tomida, Kazushi Ikeda, Masaru Sasago, Masayuki Endo, Sigeru Hayama, Noboru Nomura: Three-dimensional resist process simulator PEACE (photo and electron beam lithography analyzing computer engineering system). IEEE Trans. on CAD of Integrated Circuits and Systems 10(6): 802-807 (1991)
1987
1EEYoshihiko Hirai, Masaru Sasago, Masayuki Endo, K. Tsuji, Yojiro Mano: Process Modeling for Photoresist Development and Design of DLR/sd (Double-Layer Resist by a Single Development) Process. IEEE Trans. on CAD of Integrated Circuits and Systems 6(3): 403-409 (1987)

Coauthor Index

1Masayuki Endo [1] [2]
2Sigeru Hayama [2]
3Kazushi Ikeda [2]
4Yojiro Mano [1]
5Noboru Nomura [2]
6Masaru Sasago [1] [2]
7Sadafumi Tomida [2]
8K. Tsuji [1]

Copyright © Tue Nov 3 08:52:44 2009 by Michael Ley (ley@uni-trier.de)