![]() |
| * | 1999 | |
|---|---|---|
| 1 | EE | Michael Armacost, Peter D. Hoh, Richard Wise, Wendy Yan, Jeffrey J. Brown, John H. Keller, George A. Kaplita, Scott D. Halle, K. Paul Muller, Munir D. Naeem, Senthil Srinivasan, Hung Y. Ng, Martin Gutsche, Alois Gutmann, Bruno Spuler: Plasma-etching processes for ULSI semiconductor circuits. IBM Journal of Research and Development 43(1): 39-72 (1999) |